Boundary-induced kinetic effects in low temperature E × B plasmas

Abstract

Electron beam (e-beam) generated plasmas in applied crossed electric and magnetic (ExB) fields have demonstrated effectiveness for a range of advanced material processing applications, for instance as process reactors for low-damage (`gentle') surface modification and high density ion sources for ion implantation. The rich physics of e-beam generated ExB plasmas, which includes both fluid and kinetic instabilities, can lead to anomalous heating and transport of electrons and ions, altering device performance for material processing. This work addresses the role of an active (biased or floating) axial boundary in controlling the electron kinetics and plasma instability formation in an e-beam generated ExB plasma, with particular outlook for developing improved regimes for material processing.